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Sachin Sharma

Chemical Vapor Deposition of Epitaxial Boron-Carbon-Nitrogen Thin Films 

Overview 

I work with a Hot-Wall Chemical Vapor Deposition (CVD) setup to grow and characterize Boron Nitride and Boron Carbide thin films. With a focus on investigating the chemistry and process parameters that affect the epitaxial growth of these material systems in CVD.

Affiliations

The image shows a plasma in a coating equipment

Thin Film Physics (TUNNF)

The research in our division concerns design of new multifunctional materials for hard and wear-resistant coatings, energy materials, magnetic materials, electronics, optics, neutron-converting materials, wide-bandgap semiconductors, and more.
The image shows graphene-metal interfaces

Functional Materials unit

We investigate the properties of thin films synthesized using various Vapor Deposition and Sputtering techniques.
Group picture of Henrik Pedersen group

Pedersen Group

The Henrik Pedersen research group at 91视频 is working on chemical vapour deposition (CVD) with the aim to develop better CVD routes to, primarily, electronic materials.

Publications

2024

Sachin Sharma, Laurent Souqui, Justinas Palisaitis, Duc Quang Hoang, Ivan Gueorguiev Ivanov, Per O A Persson, Hans Högberg, Henrik Pedersen (2024) Dalton Transactions, Vol. 53, p. 10730-10736 (Article in journal)
Sachin Sharma (2024)
Sachin Sharma, Justinas Palisaitis, Ivan Gueorguiev Ivanov, Per O Å Persson, Henrik Pedersen, Hans Högberg (2024) Advanced Materials Interfaces, Vol. 11, Article 2400091 (Article in journal)

2022

Laurent Souqui, Sachin Sharma, Hans Högberg, Henrik Pedersen (2022) Dalton Transactions, Vol. 51, p. 15974-15982 (Article in journal)
Sachin Sharma, Laurent Souqui, Henrik Pedersen, Hans Högberg (2022) Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, Vol. 40, Article 033404 (Article in journal)

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